Shu Uemura Silk Bloom Restorative Mask, 200 ml

Treatment that restores damaged hair

CHF 62.51 CHF 65.81 -5%

(CHF 312.55 / l, Price shown includes 8,1% VAT. - Excludes delivery costs)

Content : 200 ml

In stock

Delivery by Tuesday, 01 April if you order by Thursday at 00:00.

Switzerland: Free standard delivery
More information regarding shipping & delivery

Features & Advantages

  • Intensive-care formula
  • For structurally damaged hair
  • Enriched with argan oil

Item no.: Xla-E1602901, Content: 200 ml, EAN: 3474630146570

Frequently bought together with Shu Uemura Ultimate Reset Extreme Repair Shampoo, 300 ml

Shu Uemura Silk Bloom Restorative Mask - 200 ml Ultimate Reset Extreme Repair Shampoo, 300 ml
Silk Bloom Restorative Mask - 200 ml CHF 62.51 (CHF 312.55 / l)
Shu Uemura Ultimate Reset Extreme Repair Shampoo, 300 ml CHF 42.07 (CHF 208.37 / l)
Total price: CHF 104.58
Description

The Silk Bloom Restorative Mask has highly restorative and intensive-care properties formulated for damaged hair. This special hair mask is enriched with argan oil that repairs the structure of the hair, reinforces its substances and provides the hair with a silky and resilient feel. Argan oil: the argan tree only flourishes in its natural habitat, Marocco, a sparse and low-moisture region. It only bears fruit after several years. The high-quality oil is derived from roasted and pounded seeds using complex methods. It is known for its reparative and regenerative effects.

Properties:

  • boosts resilience
  • restorative effects
  • nourishing

Hair & scalp types:

  • Suitable for damaged hair and normal hair types.

Application:

  • Apply to clean, towel-dried hair.
  • Leave on for r5 - 10 minutes then rinse thoroughly.
Product Types: Masks
Brand: Shu Uemura
Hair Type : For all hair types
Area of Application : Hair
Ingredients (INCI)

Aqua (Water), Cetearyl Alcohol, Behentrimonium Chloride, Glycerin, Cetyl Esters, Amodimethicone, Isopropyl Alcohol, Argania Spinosa (Argan) Kernel Oil, Methylparaben, Sodium Pca, Trideceth-6, Tocopheryl Acetate, Chlorhexidine Dihydrochloride, Cetrimoniumchlorid, Benzyl Salicylate, Alcohol, Citronellal, Benzyl Alcohol, Cumarin, 2-Oleamido-1,3-Octadecanediol, 2-Oleamido-1,3-Octadecanediol, Safflower Glucoside, Gentiana Lutea (Gentian) Root Extract, Phenoxyethanol, Tocopherol, Bht, Sodium Hydroxide, Parfum (Fragrance)

Accessories

Customer Reviews

English reviews written for Shu Uemura Silk Bloom Restorative Mask

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